Characterization of a titanium dioxide thin film using atomic force microscopy

Atomic force microscopy (AFM) is a powerful technique for characterizing nanostructured surfaces, offering atomic-level resolution alongside practical advantages such as compact design and operation under ambient conditions without the need for vacuum environments. This study highlights the effectiveness of AFM in evaluating key surface features of titanium dioxide (T iO2) thin films. Highresolution topographic images were obtained, allowing for the determination of film thickness and surface roughness, specifically the root mean square (RMS) roughness. These parameters are critical in assessing the quality and functional performance of nanostructured films.