Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C4H2F6-based gas

  1. Nam Il Cho
  2. Jong Woo Hong
  3. Hee Jin Yoo
  4. Hyeong Joon Eoh
  5. Chan Ho Kim
  6. Jun Won Jeong
  7. Kyung Lim Kim
  8. Jung Hun Kwak
  9. Yong Jun Cho
  10. Dong Woo Kim
  11. Geun Young Yeom
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  1. Version published to 10.1038/s41598-024-74107-y
  2. Version published to 10.21203/rs.3.rs-4678024/v1 on Research Square