Effect of nano-silicon priming on germination dynamics, morpho-physiological changes, osmotic adjustment and yield responses of late sown Indian mustard (Brassica juncea L.) var. Kesari Gold and TBM-143
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Indian mustard ( Brassica juncea L.) is a major oilseed crop in India, yet its productivity is constrained under late sowing and abiotic stress conditions. Nanotechnology offers novel interventions to enhance crop resilience, with silicon dioxide nanoparticles (SiO₂-NPs) recognized for their role in improving germination, growth, and stress tolerance. In this study, two mustard genotypes (Kesari Gold and TBM-143) were primed with SiO₂-NP suspensions (0–100 mgl⁻¹) and evaluated under laboratory and field conditions during the rabi season of 2024–25. Factorial randomized block design (RBD) was employed with three replications. Results demonstrated a significant varietal differences and treatment effects across germination, seedling vigour, morpho-physiological traits, accumulation of osmolytes and yield attributes. Kesari Gold consistently outperformed TBM 143, attaining higher germination percentage (92.67% vs. 88.53%), faster germination speed, and superior seedling vigour index. Nano-priming, particularly at 25–50 mgl⁻¹ (P 2 –P 3 ), enhanced radicle elongation, root volume, shoot biomass, and reduced mean germination time. Field observations confirmed improved plant height, chlorophyll content, osmotic adjustment (proline, phenol, sugar accumulation), and yield traits including siliqua number, seed yield, and harvest index in nano-primed plants over control. SiO₂ nano-priming proved effective in mitigating late sowing stress, accelerating seedling establishment, and improving physiological efficiency and yield performance. The findings establish nano-silicon priming as a scalable, eco-friendly strategy to strengthen resilience and productivity of Indian mustard under late sowing conditions.
