<span style="background: white;">A Synergistic Approach to Characterizing Chemically Deposited TiO₂ Thin Films: Unraveling Structural, Optical, Morphological, Electrochemical, and Photoelectrochemical Attributes<span style="font-size: 12.0pt;">

Titanium dioxide (TiO2) thin films were deposited onto a substrate via chemical bath deposition, a versatile and scalable coating process. This work comprehensively characterizes the resulting films, elucidating their key structural, optical, morphological, electrochemical, and photoelectrochemical properties. X-ray diffraction (XRD) analysis confirmed the formation of anatase TiO2 with a tetragonal crystal structure, providing insights into the film&rsquo;s crystalline nature. Optical properties, including absorbance, energy band gap (3.07 eV by Tauc&rsquo;s plot), and extinction coefficient, were determined using UV-visible spectroscopy, crucial for understanding the material&rsquo;s interaction with light. Scanning electron microscopy (SEM) revealed the surface morphology and cross-sectional microstructure, enabling measurement of the average film thickness (9.875 &mu;m). Electrochemical impedance spectroscopy, conducted with a polysulfide electrolyte, assessed the charge transfer resistance and electron lifetime in the absence of a dye sensitizer, providing fundamental electrochemical insights. Current-voltage (IV) characteristics demonstrated a nominal current density of 0.0884 mA/cm&sup2;, a key parameter for potential applications. This detailed characterization provides a comprehensive understanding of the chemically deposited TiO2 thin films, relevant to various applications including functional coatings and surface modifications.